Comparison between implanted boron and phosphorus in silicon wafers

Citation

Burgess, J, Johnson, B, Villis, B et al. 2010, 'Comparison between implanted boron and phosphorus in silicon wafers', Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD 2010), ed. H. Hoe Tan, Institute of Electrical and Electronics Engineers (IEEE Inc), Australia, pp. 225-226.

Year

2010

ANU Authors

Field of Research

  • Physical Sciences Not Elsewhere Classified

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