Effect of Electrode Roughness on Electroforming in HfO2 and Defect-Induced Moderation of Electric-Field Enhancement

Citation

Nandi, S, Liu, X, Venkatachalam, D et al. 2015, 'Effect of Electrode Roughness on Electroforming in HfO2 and Defect-Induced Moderation of Electric-Field Enhancement', Physical Review Applied, vol. 4, no. 6, pp. 1-11pp.

Year

2015

ANU Authors

Fields of Research

  • Surfaces And Structural Properties Of Condensed Matter
  • Metals And Alloy Materials
  • Nanoscale Characterisation

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