Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films

Citation

Venkatachalam, D, Bradby, J, Nawaz, M et al. 2011, 'Nanomechanical properties of sputter-deposited HfO2 and HfxSi1-xO2 thin films', Journal of Applied Physics, vol. 110, no. 4, p. 043527.

Year

2011

ANU Authors

Field of Research

  • Surfaces And Structural Properties Of Condensed Matter

Updated:  17 July 2024 / Responsible Officer:  Director (Research Services Division) / Page Contact:  Researchers