Formation of plasma induced surface damage in silica glass etching for optical waveguides
Citation
Choi, D, Lee, J, Kim, D et al 2004, 'Formation of plasma induced surface damage in silica glass etching for optical waveguides', Journal of Applied Physics, vol. 95, no. 12, pp. 8400 - 8407.Year
2004ANU Authors
Field of Research
- Photonics, Optoelectronics And Optical Communications