Suppression of Interdiffusion in InGaAs/GaAs Quantum Dots using Dielectric Layer of Titanium Dioxide
Citation
Fu, L, McGowan, P, Tan, H et al. 2003, 'Suppression of Interdiffusion in InGaAs/GaAs Quantum Dots using Dielectric Layer of Titanium Dioxide', Applied Physics Letters, vol. 82, no. 16, pp. 2613-2615.Year
2003Fields of Research
- Nanotechnology Not Elsewhere Classified
- Materials Engineering Not Elsewhere Classified
- Classical And Physical Optics