A protective layer on As2S3 film for photo-resist patterning
Citation
Choi, D, Madden, S, Rode, A et al 2008, 'A protective layer on As2S3 film for photo-resist patterning', Journal of Non-crystalline Solids, vol. 354, no. 2008, pp. 5253 - 5254.Year
2008ANU Authors
Fields of Research
- Photonics, Optoelectronics And Optical Communications
- Condensed Matter Characterisation Technique Development
- Surfaces And Structural Properties Of Condensed Matter